NexTech FAS

Aludra Reticle Metrology

Aludra Reticle Metrology

HIGH SPEED PARTICLE DETECTION FOR SEMICONDUCTOR RETICLES

The Aludra reticle inspection system employs light scattering technology to infer the presence of particles on a semiconductor reticle. The system simultaneously examines both the glass side and pellicle side of a reticle.

The system detects particles as small as 1 micron (PSL sphere equivalent).

Typical cycle time is varies from 35 to 70 seconds, depending upon the particle size and accuracy required. The speed of the Aludra allows 100 percent examination of reticles prior to use in step and repeat systems.

The Aludra is available in stand alone, automated and OEM-ready configurations. Application of this high speed metrology system will ensure the usability of each reticle, thus reducing the possibility of scrap through particle contamination on the reticle without impacting stepper utilization.

SUPERIOR PERFORMANCE/SMALL FOOTPRINT

  • Scan speed of 35 seconds.
  • Maps 1-20 μm particles on both glass and pellicle.
  • Custom setup can map sub micron detection.
  • 384 x 357 x 397 mm footprint.

VERSATILITY

  • Programmable pellicle height and edge exclusion zones.
  • Able to scan all types of 6 inch reticles (ASML, Nikon, Canon, Ultratech).
  • Available in standalone, automated and OEM configurations.

IMPROVES UTILIZATION

  • Fastest available reticle scanning technology.
  • 100% qualification of reticles prior to stepper usage.
  • Generates particle maps for targeted examination/cleaning.

INTEGRATED SOLUTIONS AVAILABLE

  • Orion™ Reticle Inspection System for pre-qualification, with stepper or SMIF container interface.
  • Optional calibration reticles for validating repeatability.
  • Optional desktop software for standalone use to maintain database of inspection results and export KLARF files.