NexTech FAS

Advantage Coater Line

Advantage || FPDStar || NexTStar

Advantage Coater Line

FOR HIGH PERFORMANCE SPINLESS COATING

  • Available for Gen 2 through Gen 8 substrates.
  • Able to Coat Organic or Inorganic Liquids on flexible or rigid substrates.
  • Extrusion coating technology ensures over 95% material use.
  • Extremely accurate fluid dispense rates and volume control.
  • Coating thickness range from under 200 angstroms to 150 microns.
  • Low Fill Volume option limits lot size of high cost polymers and other materials.
  • Also available for Spinless Coating of 200 and 300mm Wafers.

FEATURES

  • Granite transport base with air bearing and linear motors for smooth operation, accurate coating and high MTBF.
  • Extremely user friendly Graphical User Interface (GUI) with Touch Screen. Process is completely automated and all parameters are computer controlled.
  • Each system is supplied by separate fluid cart housing solvent vessels and pumps, as well as production quantities of coating materials.
  • System performance and reliability has been proven in a production environment.

PROCESS ADVANTAGES

  • Extrusion coating technology maximizes coating fluid utilization without the waste associated with spin coating.
  • Efficient use of coating fluids and solvents minimizes environmental impact and disposal costs.
  • Fully automatic extrusion head priming and lip functions, performed between coating runs, ensure repeatable coating performance.
  • Process is suitable for development applications and scalable to full production. Process is also fully transferable to a roll to roll configuration.

OPTIONS

  • Full atmospheric isolation to allow processing in low oxygen/low moisture environment.
  • Vacuum chucks are available for a wide variety of substrates, including display glass, flexible plastic film and stainless steel.
  • Robotic load/unload of substrates; full automation available.
  • Additional process equipment available with full integration (hot plates, chill plates, cure, inspection, etc.)